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ZHD400 high vacuum resistance evaporation coating equipment, equipped with 4-6 sets of evaporation sources; Suitable for laboratory preparation of metal elemental films, semiconductor films, perovskite solar cells, lithium batteries, organic films, etc. It can also be used for teaching and pre production process experiments on production lines.The device is designed with integrated host and control, PLC touch screen control, easy to operate, compact structure, and small footprint. The equipment is widely used in teaching, scientific research experiments in universities and research institutes, as well as exploratory experiments and the development of new products in the early stage of production-oriented enterprises.
1. Suitable for plating low melting point metal and alloy material thin films, single-layer/multi-layer/composite films, such as copper, magnesium, aluminum, gold, silver, barium, bismuth, zinc, antimony, etc;
2. Suitable for research and experimentation on solar cells and LEDs;
3. Suitable for evaporation of organic materials, etc;
4. Suitable for plating thin films of non-metallic/compound materials; Example: Molybdenum oxide, lithium fluoride, etc;
Suitable for scanning electron microscopy sample preparation, etc.
Equipment model | ZHD400 |
Coating method | multi-source evaporation coating |
Vacuum chamber structure | vertical square front door structure |
Vacuum chamber size | L400mm×W440mm×H450mm |
Heating temperature | room temperature ~ 300℃ |
Substrate table size | 120mm×120mm |
Film thickness unevenness | ≤ ±5.0% |
Evaporation source | 2-3 groups of metal sources / 2-3 groups of organic sources |
Control method | PLC + touch screen control |
Footprint | host L1710mm×W850mm×H1850mm |
Total power | ≥ 8kW |
