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Mainly used for depositing various metal thin films, metal oxide thin films, metal nitride thin films, and alloy thin films on material surfaces. These films have the characteristics of density, uniformity, high purity, and strong adhesion, which can significantly improve the wear resistance, corrosion resistance, and optical properties of the substrate.
Equipment name | Powder coating equipment |
Equipment model | JGCF350 |
Coating method | Magnetron sputtering |
Vacuum chamber structure | Φ350mmxH350mm |
Powder/particle size | ≥ 10um |
Material loading | Tray vibration |
Output | 3-10g |
Heating and baking | optional |
Sputtering source | 1-2 2-inch circular flat targets |
Footprint | L1620mm×W1060mm×H1900mm |
Total power | ≥ 8kW |
Control method | PLC/PC control (optional) |
Alarm and protection system | Complete logic program interlocking protection system |
