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High vacuum resistance evaporation coating machine, mainly used for metal material evaporation; The device is designed with integrated host and control, PLC touch screen control, easy to operate, compact structure, and small footprint; This series of equipment is widely used in teaching, scientific research experiments in universities and research institutes, as well as exploratory experiments and the development of new products in the early stage of production-oriented enterprises, and is highly praised by users
Suitable for plating thin films of low melting point metals and alloy materials, single-layer/multi-layer, such as copper, aluminum, gold, silver, etc.
Suitable for plating thin films of non-metallic/compound materials; Example: Molybdenum oxide, lithium fluoride, etc.
Suitable for scanning electron microscopy sample preparation.
Suitable for the preparation of electrodes for solar cells, LEDs, and other applications.
Equipment Model | ZHD300 |
Coating method | multi-source metal evaporation |
Vacuum chamber structure | glass bell + stainless steel base |
Size of vacuum chamber | Φ300mm×H360mm |
Heating temperature | room temperature～250℃ |
Substrate table size | Φ100mm |
Unevenness of film thickness | ≤ ±5.0% within the range of Φ80mm |
Evaporation source | 2 groups of metal evaporation source |
Control mode | PLC + touch screen control |
Floor space | host L1100mm×W800mm |
Total power | ≥ 5kW |
Scope of application | colleges and universities, research institutes and enterprises for the scientific research of new thin film materials and small batch preparation |
