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This system is a high vacuum new cathode arc source+magnetron sputtering+ion source and DC pulse bias power assisted combined coating system. It is widely used for depositing high-performance wear-resistant and corrosion-resistant ceramics, metal functional conductive films, etc. on the outer and inner surfaces of precision cutting tools, molds or bearings, such as TiAlN, TiN, Cu, Al, ITO, etc;
1. This device can be used to prepare single-layer and multi-layer metal films, dielectric films, semiconductor films, sensor films, heat-resistant alloy films, hard films, corrosion-resistant films, DLC, etc;
2. Applied to cutting tools, molds, electronic components, metal casings, ceramic substrates, etc;
3. Suitable for pilot and small-scale production, as well as the production of precious metal precision parts;
4. Specialization, functionalization, platformization, and refined design meet the development and preparation of different functional membrane systems; Fully automatic control, user-friendly design for easier operation and stable process repeatability;
Equipment name | Multifunctional magnetron ion sputtering composite coating equipment |
Equipment model | TSU650 |
Vacuum chamber structure | vertical cylindrical front door, double-layer water cooling, multi-universal flange interface |
Vacuum chamber size | Φ650mm×H650mm |
Workpiece rack size | Φ490mm, 4-6 station public/rotating workpiece rack |
Workpiece rack baking temperature | room temperature ~ 500±5℃, adjustable and controllable (PID temperature control) |
Workpiece rack movement mode | revolution 0-5RPM adjustable |
Auxiliary ion source | bias, linear ion source auxiliary (optional) |
Cathode | rectangular magnetron target, cylindrical target, plane arc source, magnetic filter arc source (optional) Domestic or imported target, or power supply optional |
Control mode | PLC control/industrial computer full automatic control optional |
Footprint | host L2800mm×W1200mm×H1950mm |
Total power | ≥ 60kW |
Optional parts | substrate stage heating system, water circulation machine, film thickness control system, etc. |
