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Mainly used for the deposition of diamond films. The equipment consists of several parts: reaction chamber, heating system, vacuum system, substrate table rotating (lifting) mechanism, reaction gas supply system, rack, and electrical control.
1. It can be used to deposit thick diamond coatings, nano diamond films, etc., effectively depositing uniformly grown diamond within an area of 150mm
2. Can be used for depositing tool coatings, such as micro - and nano diamond coatings, DLC, etc
3. Can be used for developing conductive coating applications, such as BDD and corrosion-resistant electrodes
4. Can be used for depositing mold coatings, such as wire drawing molds, compression molds, etc
Equipment name | Hot wire CVD diamond film deposition equipment |
Equipment model | HF450 |
Vacuum chamber structure | vertical front door structure, rear exhaust system, double-layer water cooling |
Vacuum chamber size | Φ450mmxH500mm |
Vacuum system | compound molecular pump high vacuum system |
Substrate table size | Φ100mm |
Substrate temperature | 600 ~ 1100℃ |
Power supply | dedicated hot wire power supply 400A, constant current or constant power mode |
Gas path control | 4-way gas flow control |
Control mode | PLC touch screen control |
Footprint | host L1200mm×W1060mm×H1900mm |
Total power | ≥ 20kW |
