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Mainly used for depositing various metal thin films, metal oxide thin films, metal nitride thin films, and alloy thin films on material surfaces. These films have the characteristics of density, uniformity, high purity, and strong adhesion, which can significantly improve the wear resistance, corrosion resistance, and optical properties of the substrate.
Equipment name | Powder coating equipment |
Equipment model | JGCF1000 |
Coating method | magnetron sputtering |
Vacuum chamber structure | Φ600mmxL1000mm |
Powder/particle size | ≥ 20um |
Material loading | slot type vibration type, continuous feeding |
Output | 2000g |
Heating and baking | optional |
Sputtering source | rectangular/cylindrical target |
Footprint | L1620mm×W1060mm×H1900mm |
Total power | ≥ 20kW |
Control method | PLC/PC control (optional) |
Alarm and protection system | Complete logic program interlocking protection system |
