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Used for growing millimeter level diamond thick films, nanocrystalline diamond coatings or microcrystalline diamond coatings, diamond-like carbon films, silicon nitride and silicon oxide films, etc., depositing diamond films on the surfaces of cutting tools, molds, taps, BDD water treatment electrodes, etc.
1. Applied to the double-sided growth of large-sized nano/micron diamonds, saving energy consumption. Not easily broken.
2. Fast deposition rate: The hot wire CVD HF1200 coating machine has a high deposition rate and can quickly complete thin film preparation.
3. High membrane quality: The prepared membrane has good water vapor barrier properties and a longer stability period in boiling tests.
4. Process stability: Adopting a dual door structure and liquid gas supply system, the flow rate is stable and controllable, ensuring process stability.
Equipment name | Hot wire CVD diamond film deposition equipment |
Equipment model | HF1200 |
Vacuum chamber structure | vertical front door structure, rear exhaust system, double-layer water cooling |
Vacuum chamber size | Φ1200mmxH1200mm |
Vacuum system | high vacuum pump system |
Substrate table size | Φ500mm²×600mm² square substrate stage (rotation, lifting optional) |
Substrate temperature | 600 ~ 1100℃ |
Power supply | dedicated hot wire power supply 2200A, constant current or constant power mode |
Gas path control | 4-way gas flow control |
Control mode | PC+PLC+ touch screen control |
Footprint | host L5000mm×W3000mm×H4000mm |
Total power | ≥ 300kW |
