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The resistance value is uniform and controllable, and can be controlled as a stable resistance or a gradual resistance. With the self-developed fully automatic control system, one click operation can be achieved; Ensure continuous and stable coating performance of the product; The equipment adopts a modular design, which can add coating modules and their expansion modules according to production requirements. The equipment is easy to disassemble and maintain.
Adopting magnetron sputtering method, the deposition rate is fast, the film layer is uniform and dense, and the brightness is good.
It is suitable for depositing nanoscale metal films (gold, silver, copper, aluminum, chromium, etc.), semiconductor films (ITO, AZO, etc.), dielectric films (titanium oxide, chromium oxide, tungsten oxide), etc. on large-area glass, acrylic board, PC surfaces. It is widely used in industries such as photovoltaics, optoelectronics, touch screens, semiconductors, flat electrode and architectural decorative glass.
